In a groundbreaking move, the Department of Biotechnology, as part of the BioE3 Policy, has initiated a national effort to make high-quality microbial platform strains accessible to Indian researchers, with a ‘freedom-to-operate’ status. These strains, along with associated toolkits, will be made available to Indian researchers through BioE3 Strain Resource Centre for fostering High-Performance Biomanufacturing (BioE3 SRC), at BRIC-NCCS, Pune upon signing of legal agreements (Licensing Agreement and the Repository Deposit Agreement) and payment of a nominal Licensing fee to the depositor. This initiative will empower indigenous innovation and accelerate high-performance biomanufacturing activities across the country.
Strain Catalogue
The listed strains represent production strains currently available in our repository, along with associated information. These strains are optimized for various industrial applications, from enzyme production to metabolite synthesis. Biotech entrepreneurs and researchers can access detailed information for each strain through the links provided below.
Talaromyces pinophilus L42 |
Paenibacillus polymyxa A18 |
Chlorella sorokiniana I |
Saccharomyces cerevisiae NGY |
Vibrio cholerae BB1 |
Escherichia coli SSY05 |
The repository follows an open-access model for viewing strain data, while actual strain requests require agreement to licensing terms (Order Request Form and Licensing Agreement). Each catalogue entry includes essential details to help you find the right strain for your needs.
The catalogue features a portfolio of validated microbial and algal strains optimized for industrial high-performance biomanufacturing. Each entry includes scale-up data, genomic identifiers, and available protocols, along with sequencing information enabling ready deployment by researchers and startups. Downloadable links are provided for each strain, including vector sequences and maps (with FTO status), standardized protocols for growth and production, and supplementary information such as omics data or strain background.